Summary
Global energy demand for information and communication technologies may reach up to 20% of total energy by the end of the decade. Innovations on transistor technologies, following Moore’s law, can in part compensate for this rise and improve sustainability by providing more energy-efficient electronics. However, the energy-efficiency of CMOS is limited by the Boltzmann physics, which sets a lower bound on the operating voltage, and thereby the power. To sustain miniaturization, and improved performance of electronics, new transistor technologies are needed that can overcome this limit.
AttoSwitch will develop a novel cold-source transistor technology that uses the intrinsically cold carrier distribution of Dirac semimetals to overcome the Boltzmann limit. The main objective is to develop a scalable Dirac transistor technology based on large-area integration of 2D and 3D Dirac materials, e.g. graphene and CoSi, and the realization of high-performance device demonstrators at technologically relevant length scales. Key demonstrators are based on graphene integrated with MoS2 and WSe2 channels, as well as novel work on 3D Dirac semimetals. Our methodology includes development of device process modules and extensive material and device characterization. Systematic modeling using new simulation frameworks plays a key part to benchmark and provide a road map for the technology. Our ambitious performance targets include a subthreshold swing of 35 mV/decade and a switching energy of 4 attojoule.
The project links to ongoing European efforts, such as the 2D-experimental pilot line, and the goals set by the European Chips Act. AttoSwitch will impact the semiconductor supply chain at the technology and materials levels, and provide ultra-energy-efficient transistors for logic and high-frequency analog integrated chip markets. Outreach to students, training of young researchers and building international cooperation will also support Europe’s competitiveness in semiconductors.
AttoSwitch will develop a novel cold-source transistor technology that uses the intrinsically cold carrier distribution of Dirac semimetals to overcome the Boltzmann limit. The main objective is to develop a scalable Dirac transistor technology based on large-area integration of 2D and 3D Dirac materials, e.g. graphene and CoSi, and the realization of high-performance device demonstrators at technologically relevant length scales. Key demonstrators are based on graphene integrated with MoS2 and WSe2 channels, as well as novel work on 3D Dirac semimetals. Our methodology includes development of device process modules and extensive material and device characterization. Systematic modeling using new simulation frameworks plays a key part to benchmark and provide a road map for the technology. Our ambitious performance targets include a subthreshold swing of 35 mV/decade and a switching energy of 4 attojoule.
The project links to ongoing European efforts, such as the 2D-experimental pilot line, and the goals set by the European Chips Act. AttoSwitch will impact the semiconductor supply chain at the technology and materials levels, and provide ultra-energy-efficient transistors for logic and high-frequency analog integrated chip markets. Outreach to students, training of young researchers and building international cooperation will also support Europe’s competitiveness in semiconductors.
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More information & hyperlinks
| Web resources: | https://cordis.europa.eu/project/id/101135571 |
| Start date: | 01-01-2024 |
| End date: | 30-06-2027 |
| Total budget - Public funding: | 3 884 248,75 Euro - 3 884 248,00 Euro |
Cordis data
Original description
Global energy demand for information and communication technologies may reach up to 20% of total energy by the end of the decade. Innovations on transistor technologies, following Moore’s law, can in part compensate for this rise and improve sustainability by providing more energy-efficient electronics. However, the energy-efficiency of CMOS is limited by the Boltzmann physics, which sets a lower bound on the operating voltage, and thereby the power. To sustain miniaturization, and improved performance of electronics, new transistor technologies are needed that can overcome this limit.AttoSwitch will develop a novel cold-source transistor technology that uses the intrinsically cold carrier distribution of Dirac semimetals to overcome the Boltzmann limit. The main objective is to develop a scalable Dirac transistor technology based on large-area integration of 2D and 3D Dirac materials, e.g. graphene and CoSi, and the realization of high-performance device demonstrators at technologically relevant length scales. Key demonstrators are based on graphene integrated with MoS2 and WSe2 channels, as well as novel work on 3D Dirac semimetals. Our methodology includes development of device process modules and extensive material and device characterization. Systematic modeling using new simulation frameworks plays a key part to benchmark and provide a road map for the technology. Our ambitious performance targets include a subthreshold swing of 35 mV/decade and a switching energy of 4 attojoule.
The project links to ongoing European efforts, such as the 2D-experimental pilot line, and the goals set by the European Chips Act. AttoSwitch will impact the semiconductor supply chain at the technology and materials levels, and provide ultra-energy-efficient transistors for logic and high-frequency analog integrated chip markets. Outreach to students, training of young researchers and building international cooperation will also support Europe’s competitiveness in semiconductors.
Status
SIGNEDCall topic
HORIZON-CL4-2023-DIGITAL-EMERGING-01-11Update Date
12-03-2024
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Organisations
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| CONSORZIO NAZIONALE INTERUNIVERSITARIO PER LA NANOELETTRONICA (IUNET) (Coördinator)
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| ALMA MATER STUDIORUM-UNIVERSITA DI BOLOGNA
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| GESELLSCHAFT FUR ANGEWANDTE MIKRO UND OPTOELEKTRONIK MIT BESCHRANKTERHAFTUNG AMO GMBH
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| IBM RESEARCH GMBH
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| INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM VZW
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| LABORATORIO IBERICO INTERNACIONAL DE NANOTECNOLOGIA (LIN INL)
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| LUNDS UNIVERSITET
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| UNIVERSITA DEGLI STUDI DI UDINE
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| University of Modena and Reggio Emilia