SPRINT | Ultra-versatile Structural PRINTing of amorphous and tuned crystalline matter on multiple substrates

Summary
Thin film deposition methods are crucial to generate progress in Key Enabling Technologies (KETs) of strategic importance for Europe, including Advanced Materials, Nanotechnology, Micro- and Nanoelectronics, Biotechnology, and Photonics. Devices like photovoltaic cells, light emitting diodes, electronic and optoelectronic micro-/nano-sensors are prominent examples of thin film applications where the precise control of material deposition and its degree of order (crystallinity) are of paramount importance for their performance and function. However, technologies for thin film deposition have very limited capacity to tune the material crystallinity at room temperature and atmospheric pressure, or to create functional 3D architectures in a single and versatile manner. The requirement of high temperatures and vacuum conditions make them inherently costly and unsuitable for deposition on various substrates (e.g. plastics). Moreover, their dimensions are not compatible with miniaturization and integration in table-top interfaces that would broaden their potential use. These limitations restrain the development of ground-breaking functional materials and new-conceptual devices. The absence of a radically new deposition technology hampers innovation and the appearance of new and cost-effective marketable products. Therefore, it is of utmost importance to develop a radically new deposition technology to overcome these limitations, and that is at the core of the SPRINT project. SPRINT will develop a universal deposition technology of amorphous and tuned crystalline matter on multiple substrates, at room temperature and pressure. This technology not only combines the benefits of existing advanced deposition methods, at significantly lower cost and higher deposition rates, but also goes beyond the state-of-the-art in advanced materials development, to open new roadmaps to a plethora of future devices and applications.
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More information & hyperlinks
Web resources: https://cordis.europa.eu/project/id/801464
Start date: 01-09-2018
End date: 28-02-2023
Total budget - Public funding: 2 999 997,50 Euro - 2 999 997,00 Euro
Cordis data

Original description

Thin film deposition methods are crucial to generate progress in Key Enabling Technologies (KETs) of strategic importance for Europe, including Advanced Materials, Nanotechnology, Micro- and Nanoelectronics, Biotechnology, and Photonics. Devices like photovoltaic cells, light emitting diodes, electronic and optoelectronic micro-/nano-sensors are prominent examples of thin film applications where the precise control of material deposition and its degree of order (crystallinity) are of paramount importance for their performance and function. However, technologies for thin film deposition have very limited capacity to tune the material crystallinity at room temperature and atmospheric pressure, or to create functional 3D architectures in a single and versatile manner. The requirement of high temperatures and vacuum conditions make them inherently costly and unsuitable for deposition on various substrates (e.g. plastics). Moreover, their dimensions are not compatible with miniaturization and integration in table-top interfaces that would broaden their potential use. These limitations restrain the development of ground-breaking functional materials and new-conceptual devices. The absence of a radically new deposition technology hampers innovation and the appearance of new and cost-effective marketable products. Therefore, it is of utmost importance to develop a radically new deposition technology to overcome these limitations, and that is at the core of the SPRINT project. SPRINT will develop a universal deposition technology of amorphous and tuned crystalline matter on multiple substrates, at room temperature and pressure. This technology not only combines the benefits of existing advanced deposition methods, at significantly lower cost and higher deposition rates, but also goes beyond the state-of-the-art in advanced materials development, to open new roadmaps to a plethora of future devices and applications.

Status

CLOSED

Call topic

FETOPEN-01-2016-2017

Update Date

27-04-2024
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Horizon 2020
H2020-EU.1. EXCELLENT SCIENCE
H2020-EU.1.2. EXCELLENT SCIENCE - Future and Emerging Technologies (FET)
H2020-EU.1.2.1. FET Open
H2020-FETOPEN-2016-2017
FETOPEN-01-2016-2017 FET-Open research and innovation actions