Revealing the Stoichiometric Tolerance of Lead Trihalide Perovskite Thin Films

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Authors: Alexandra J. Ramadan, Maryline Ralaiarisoa, Fengshuo Zu, Luke A. Rochford, Bernard Wenger, Norbert Koch, Henry J. Snaith

Journal title: Chemistry of Materials

Journal number: 32/1

Journal publisher: American Chemical Society

Published year: 2019

Published pages: 114-120

DOI identifier: 10.1021/acs.chemmater.9b02639

ISSN: 0897-4756