Optimizing reactive ion etching to remove sub-surface polishing damage on diamond

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Authors: Marie-Laure Hicks, Alexander C. Pakpour-Tabrizi, Verena Zuerbig, Lutz Kirste, Christoph Nebel, Richard B. Jackman

Journal title: Journal of Applied Physics

Journal number: 125/24

Journal publisher: American Institute of Physics

Published year: 2019

Published pages: 244502

DOI identifier: 10.1063/1.5094751

ISSN: 0021-8979