High Temperature Annealing of ZnO:Al on Passivating POLO Junctions: Impact on Transparency, Conductivity, Junction Passivation, and Interface Stability

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Authors: Tobias F. Wietler, Byungsul Min, Sina Reiter, Yevgeniya Larionova, Rolf Reineke-Koch, Frank Heinemeyer, Rolf Brendel, Armin Feldhoff, Jan Krugener, Dominic Tetzlaff, Robby Peibst

Journal title: IEEE Journal of Photovoltaics

Journal number: 9/1

Journal publisher: IEEE Electron Devices Society

Published year: 2019

Published pages: 89-96

DOI identifier: 10.1109/jphotov.2018.2878337

ISSN: 2156-3381