Polysilicon Layers Doped by Plasma Immersion Ion Implantation (PIII): New Paths for Industrial Processing of Passivated Contacts Solar Cells

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Authors: A. Veau, T. Desrues, C. Oliveau, A. Morisset, B. Martel, F. Torregrosa, L. Roux, A. Kaminski-Cachopo, Q. Rafhay, S. Dubois

Journal title: EU PVSEC 2019

Journal number: 2BO.3.3

Journal publisher: WIP GmbH & Co Planungs-KG

Published year: 2019