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Authors: Bin WU, Chao GAO, Feng LIU, Ming XUE, Yushuai WANG, Borui ZHENG
Journal title: Plasma Science and Technology
Journal number: 21/4
Journal publisher: Institute of Plasma Physics
Published year: 2019
Published pages: 045501
DOI identifier: 10.1088/2058-6272/aaf2e2
ISSN: 1009-0630