Expanding Thermal Plasma Deposition of Al-Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms

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Authors: Benjamin L. Williams, Mikhail V. Ponomarev, Marcel A. Verheijen, Harm C. M. Knoops, Abhinaya Chandramohan, Leo Duval, Mauritius C. M. van de Sanden, Mariadriana Creatore

Journal title: Plasma Processes and Polymers

Journal number: 13/1

Journal publisher: Wiley - V C H Verlag GmbbH & Co.

Published year: 2016

Published pages: 54-69

DOI identifier: 10.1002/ppap.201500179

ISSN: 1612-8850