Study of Nanosecond Laser Annealing on Silicon Doped Hafnium Oxide Film Crystallization and Capacitor Reliability

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Authors: T. Ali; R. Olivo; S. Kerdilès; D. Lehninger; M. Lederer; D. Sourav; A-S. Royet; A. Sünbül; A. Prabhu; K. Kühnel; M. Czernohorsky, M. Rudolph; R. Hoffmann; C. Charpin-Nicolle; L. Grenouillet; T. Kämpfe; K. Seidel

Journal title: 2022 IEEE International Memory Workshop (IMW), 2022, pp. 1-4,

Journal publisher: IEEE Xplore

Published year: 2022

DOI identifier: 10.1109/imw52921.2022.9779281