High Throughput Scanning Probe Metrology for High-NA EUV photoresist profiling

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Authors: Artem Khatchaturiants, Marta Mucientes, Arseniy Kalinin, Yan Guo, Seokhan Kim, Alain Moussa, Janusz Bogdanowicz, Joren Severi, Gian Lorusso, Danilo De Simone, Anne-Laure Charley, Philippe Leray, Maarten E. van Reijzen, Cornel Bozdog, Hamed M. Sadeghian

Journal title: Proceedings SPIE Volume PC12053, Metrology, Inspection, and Process Control XXXVI; PC120530I (2022)

Journal publisher: SPIE

Published year: 2022

DOI identifier: 10.1117/12.2616089