Sub 10-nm ferroelectric Gd-doped HfO2 Layers

Summary

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: E.V. Skopin, N. Guillaume, L. Alrifai, P. Gonon, and A. Bsiesy

Journal title: Appl. Phys. Lett. 120, 172901 (2022)

Journal number: 00036951

Journal publisher: American Institute of Physics

Published year: 2022

DOI identifier: 10.1063/5.0088505

ISSN: 0003-6951