High NA EUV enabling cost efficient scaling for N+1 technology nodes

Summary

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Authors: Greet Storms, Sjoerd Lok, Rob van Ballegoij, Jan van Schoot, Rudy Peeters, Diederik de Bruin, Kars Troost, Teun van Gogh

Journal title: SPIE Advanced Lithography + Patterning, 2022, San Jose, California, United States

Journal publisher: SPIE

Published year: 2022

DOI identifier: 10.1117/12.2617240