High-NA EUV photoresist metrology using high-throughput scanning probe microscopy

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Authors: M. Mucientes, A. Khachaturiants, R. Trussell, A. Kalinin, Y. Guo, E. C. Simons, S. Kim, O. Nadyarnykh, A. Moussa, J. Bogdanowicz, J. Severi, G. Lorusso, D. De Simone, A.-L. Charley, P. Leray, M. E. van Reijzen, C. Bozdog, H. Sadeghian

Journal title: Proceedings Volume 12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; 123250M (2022)

Journal number: XXVIII

Journal publisher: SPIE

Published year: 2022

DOI identifier: 10.1117/12.2641698