Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography

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Authors: G. J. Rademaker, A. Le Pennec, T. J. Giammaria, K. Benotmane, H. Pham, C. Bouet, M. G. Gusmao Cacho, M. Argoud, M.-L. Pourteau, A. Paquet, A. Gharbi, C. Navarro, C. Nicolet, X. Chevalier, K. Sakavuyi, P. Nealey, R. Tiro

Journal publisher: SPIE

Published year: 2020

DOI identifier: 10.1117/12.2552003