Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application

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Authors: Maria Gabriela Gusmão Cacho, Khatia Benotmane, Patricia Pimenta-Barros, Charlotte Bouet, Guido Rademaker, Maxime Argoud, Christophe Navarro, Raluca Tiron, and Nicolas Possémé

Journal title: Journal of Vacuum Science & Technology B

Journal publisher: AIP

Published year: 2021

DOI identifier: 10.1116/6.0001102

ISSN: 2166-2746