In Situ Phosphorus-Doped Poly-Si by Low Pressure Chemical Vapor Deposition for Passivating Contacts

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Authors: Meriç Fırat; Hariharsudan Sivaramakrishnan Radhakrishnan; Maria Recaman Payo; Filip Duerinckx; Rajiv Sharma; Jef Poortmans

Journal title: Solar Energy

Journal number: Volume 231, 1 January 2022, Pages 78-87

Journal publisher: Elsevier

Published year: 2022

DOI identifier: 10.1109/pvsc45281.2020.9300543

ISSN: 0038-092X