A comprehensive atomistic picture of the as-deposited Ni-Si interface before thermal silicidation process

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Authors: C. Jara Donoso, A. Jay, J. Lam, J. Muller, G. Larrieu, G. Landa, C. Bongiorno, A. La Magna, A. Alberti, A. Hemeryck

Journal title: Appl. Surf. Sci.

Journal number: 631

Journal publisher: Elsevier BV

Published year: 2023

Published pages: 157563

DOI identifier: 10.1016/j.apsusc.2023.157563

ISSN: 0169-4332