Oxygen vacancy and hydrogen in amorphous HfO₂

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Authors: Benoît Sklénard; Lukas Cvitkovich; Dominic Waldhoer; Jing Li

Journal title: J. Phys. D

Journal number: 56

Journal publisher: Institute of Physics Publishing (IOP)

Published year: 2023

Published pages: 245301

DOI identifier: 10.1088/1361-6463/acc878

ISSN: 1361-6463