Oxide thickness-dependent resistive switching characteristics of Cu/HfO2/Pt ECM devices

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Authors: Taewook Kim, Tobias Vogel, Eszter Piros, Déspina Nasiou, Nico Kaiser, Philipp Schreyer, Robert Winkler, Alexander Zintler, Alexey Arzumanov, Stefan Petzold, Leopoldo Molina-Luna, Lambert Alff

Journal title: Appl. Phys. Lett. 122, 023502 (2023)

Journal publisher: American Institute of Physics

Published year: 2023

DOI identifier: 10.1063/5.0124781

ISSN: 0003-6951