Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices

Summary

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Authors: Emanuel Knehr; Emanuel Knehr; Mario Ziegler; Sven Linzen; Konstantin Ilin; Patrick Schanz; Jonathan Plentz; Marco Diegel; Heidemarie Schmidt; Heidemarie Schmidt; Evgeni Il'ichev; Michael Siegel

Journal title: Journal of vacuum science and technology A

Journal number: 39

Journal publisher: American Institute of Physics

Published year: 2021

Published pages: 052401

DOI identifier: 10.1116/6.0001126

ISSN: 1520-8559