Versatile 3D GaN processing for integrated high-aspect-ratio vertical nanodevices

Summary

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Authors: Jan Gülink, Klaas Strempel, Feng Yu, Muhammad Fahlesa Fatahilah, Shinta Mariana, Steffen Bornemann, Tony Granz, Nicolai Markiewicz, Joan Daniel Prades, Hutomo Suryo Wasisto, Andreas Waag

Journal title: MNE 2018 – The 44th International Conference on Micro- and Nanofabrication and Manufacturing using Lithography and Related Techniques

Journal number: 24-27 September 2018

Journal publisher: MNE 2018 – The 44th International Conference on Micro- and Nanofabrication and Manufacturing using Lithography and Related Techniques

Published year: 2018

DOI identifier: 10.5281/zenodo.2489490