Preparation of atomic layer deposited vanadium dioxide thin films using tetrakis(ethylmethylamino) vanadium as precursor

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Authors: Guandong Bai, Kham M. Niang, John Robertson

Journal title: Journal of Vacuum Science & Technology A

Journal number: 38/5

Journal publisher: American Institute of Physics

Published year: 2020

Published pages: 052402

DOI identifier: 10.1116/6.0000353

ISSN: 0734-2101