Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition

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Authors: Kham M. Niang, Guandong Bai, John Robertson

Journal title: Journal of Vacuum Science & Technology A

Journal number: 38/4

Journal publisher: American Institute of Physics

Published year: 2020

Published pages: 042401

DOI identifier: 10.1116/6.0000152

ISSN: 0734-2101