Controlled deposition of plasma-polyaniline thin film by PECVD: Understanding the influence of aniline to argon ratio

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Authors: C. Pattyn, D. Sciacqua, L. Kwiedor, A. Jagodar, T. Strunskus, F. Traeger, Th. Lecas, E. Kovacevic, J. Berndt.

Journal title: Plasma Processes and Polymers

Journal number: 19/5

Journal publisher: Wiley

Published year: 2022

DOI identifier: 10.1002/ppap.202100233

ISSN: 1612-8869