Advanced and reliable GaAs/AlGaAs ICP-DRIE etching for optoelectronic, microelectronic and microsystem applications

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: P.B. Vigneron, F. Joint, N. Isac, R. Colombelli, E. Herth

Journal title: Microelectronic Engineering

Journal number: 202

Journal publisher: Elsevier BV

Published year: 2018

Published pages: 42-50

DOI identifier: 10.1016/j.mee.2018.09.001

ISSN: 0167-9317