Plasma enhanced atomic layer etching of high-k layers on WS2

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Authors: J.-F. de Marneffe, D. Marinov, A. Goodyear, P.-J. Wyndaele, N. St. J. Braithwaite, S. Kundu, I. Asselberghs, M. Cooke, and S. De Gendt

Journal title: Journal of Vacuum Science & Technology

Journal number: 15208559

Journal publisher: AIP Publishing LLC

Published year: 2022

DOI identifier: 10.1116/6.0001726

ISSN: 1520-8559