Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

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Authors: R. Lukose, M. Lisker, F. Akhtar, M. Fraschke, T. Grabolla, A. Mai, M. Lukosius

Journal title: Scientific Reports

Journal number: 11/1

Journal publisher: Nature Publishing Group

Published year: 2021

DOI identifier: 10.1038/s41598-021-92432-4

ISSN: 2045-2322