Reliable metal–graphene contact formation process flows in a CMOS-compatible environment

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Authors: M. Elviretti, M. Lisker, R. Lukose, M. Lukosius, F. Akhtara, A. Maiab

Journal title: Nanoscale Advances

Journal number: 25160230

Journal publisher: The Royal Society of Chemistry

Published year: 2022

DOI identifier: 10.1039/d2na00351a

ISSN: 2516-0230