Plasma‐Enhanced Atomic Layer Deposition of Al 2 O 3 on Graphene Using Monolayer hBN as Interfacial Layer

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Authors: Bárbara Canto, Martin Otto, Michael J. Powell, Vitaliy Babenko, Aileen O'Mahony, Harm C. M. Knoops, Ravi S. Sundaram, Stephan Hofmann, Max C. Lemme, Daniel Neumaier

Journal title: Advanced Materials Technologies

Journal number: 6/11

Journal publisher: Wiley

Published year: 2021

Published pages: 2100489

DOI identifier: 10.1002/admt.202100489

ISSN: 2365-709X