N 2 –H 2 capacitively coupled radio-frequency discharges at low pressure: II. Modeling results: the relevance of plasma-surface interaction

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Authors: Miguel Jiménez-Redondo, Audrey Chatain, Olivier Guaitella, Guy Cernogora, Nathalie Carrasco, Luis Lemos Alves, Luis Marques

Journal title: Plasma Sources Science and Technology

Journal number: 29/8

Journal publisher: IOP

Published year: 2020

Published pages: 085023

DOI identifier: 10.1088/1361-6595/ab9b1b

ISSN: 1361-6595