Relative oxidation state of the target as guideline for depositing optical quality RF reactive magnetron sputtered Al 2 O 3 layers

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Authors: Carlijn I. van Emmerik, Ward A. P. M. Hendriks, Martijn M. Stok, Michiel de Goede, Lantian Chang, Meindert Dijkstra, Frans Segerink, Dominic Post, Enrico G. Keim, Mike J. Dikkers, Sonia M. García-Blanco

Journal title: Optical Materials Express

Journal number: 10/6

Journal publisher: Optical Society of America

Published year: 2020

Published pages: 1451

DOI identifier: 10.1364/ome.393058

ISSN: 2159-3930