Comparative Study of Al 2 O 3 and HfO 2 for Surface Passivation of Cu(In,Ga)Se 2 Thin Films: An Innovative Al 2 O 3 /HfO 2 Multistack Design

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Authors: Romain Scaffidi, Dilara G. Buldu, Guy Brammertz, Jessica de Wild, Thierry Kohl, Gizem Birant, Marc Meuris, Jef Poortmans, Denis Flandre, Bart Vermang

Journal title: physica status solidi (a)

Journal number: 218/14

Journal publisher: Wiley - V C H Verlag GmbbH & Co.

Published year: 2021

Published pages: 2100073

DOI identifier: 10.1002/pssa.202100073

ISSN: 1862-6300