A route to engineered high aspect-ratio silicon nanostructures through regenerative secondary mask lithography.

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Authors: Martyna Michalska; Sophia K. Laney; Tao Li; Manish K. Tiwari; Ivan P. Parkin; Ioannis Papakonstantinou

Journal title: Nanoscale

Journal number: 1

Journal publisher: Royal Society of Chemistry

Published year: 2022

DOI identifier: 10.1039/d1nr07024j

ISSN: 2040-3372