Improved thermoelectric properties of nanocrystalline hydrogenated silicon thin films by post-deposition thermal annealing

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Authors: Joana Loureiro, Tiago Mateus, Sergej Filonovich, Marisa Ferreira, Joana Figueira, Alexandra Rodrigues, Brian F. Donovan, Patrick E. Hopkins, Isabel Ferreira

Journal title: Thin Solid Films

Journal number: 642

Journal publisher: Elsevier Sequoia

Published year: 2017

Published pages: 276-280

DOI identifier: 10.1016/j.tsf.2017.09.047

ISSN: 0040-6090