In-line metrology for roll-to-roll UV assisted nanoimprint lithography using diffractometry

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Authors: Martin Kreuzer, Guy L. Whitworth, Achille Francone, Jordi Gomis-Bresco, Nikolaos Kehagias, Clivia M. Sotomayor-Torres

Journal title: APL Materials

Journal number: 6/5

Journal publisher: American Institute of Physics

Published year: 2018

Published pages: 058502

DOI identifier: 10.1063/1.5011740

ISSN: 2166-532X