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Authors: N. Pourali, V. Hessel, E.V. Rebrov
Journal title: Plasma Chemistry and Plasma Processing volume
Journal number: 42
Journal publisher: Kluwer Academic/Plenum Publishers
Published year: 2022
Published pages: 619–640
DOI identifier: 10.1007/s11090-022-10242-6
ISSN: 0272-4324