Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors

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Authors: Marc J. M. Merkx; Athanasios Angelidis; Alfredo Mameli; Jun Li; Paul C. Lemaire; Kashish Sharma; Dennis M. Hausmann; Wilhelmus M. M. Kessels; Tania E. Sandoval; Adriaan J. M. Mackus

Journal title: Journal of Physical Chemistry C, 126(10), 4845 - 4853. American Chemical Society

Journal number: 1

Journal publisher: American Chemical Society

Published year: 2022

DOI identifier: 10.1021/acs.jpcc.1c10816

ISSN: 1932-7447