Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor

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Authors: I. Tezsevin; J. F. W. Maas; M. J. M. Merkx; R. Lengers; W. M. M. Kessels; T. E. Sandoval; A. J. M. Mackus

Journal title: Langmuir

Journal number: 39

Journal publisher: American Chemical Society

Published year: 2023

Published pages: 4265-4273

DOI identifier: 10.1021/acs.langmuir.2c03214

ISSN: 1520-5827