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Authors: Christopher de Leeuwe, Wenting Hu, John Evans, Moritz von Stosch, Ian S Metcalfe
Journal title: Chemical Engineering Journal
Journal number: 423
Journal publisher: Elsevier BV
Published year: 2021
Published pages: 130174
DOI identifier: 10.1016/j.cej.2021.130174
ISSN: 1385-8947