Optical dielectric properties of HfO2-based films

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Authors: Hongyi Dou, Nives Strkalj, Yizhi Zhang, Judith L. MacManus-Driscoll, Quanxi Jia, and Haiyan Wang

Journal title: Journal of Vacuum Science & Technology A

Journal publisher: American Institute of Physics

Published year: 2021

DOI identifier: 10.1116/6.0001651

ISSN: 1520-8559