Robust quantum point contact operation of narrow graphene constrictions patterned by AFM cleavage lithography

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Authors: Péter Kun, Bálint Fülöp, Gergely Dobrik, Péter Nemes-Incze, István Endre Lukács, Szabolcs Csonka, Chanyong Hwang, Levente Tapasztó

Journal title: npj 2D Materials and Applications

Journal number: 4/1

Journal publisher: Nature Springer

Published year: 2020

Published pages: 1-6

DOI identifier: 10.1038/s41699-020-00177-x

ISSN: 2397-7132