Through-membrane electron-beam lithography for ultrathin membrane applications

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: M. Neklyudova, A. K. Erdamar, L. Vicarelli, S. J. Heerema, T. Rehfeldt, G. Pandraud, Z. Kolahdouz, C. Dekker, H. W. Zandbergen

Journal title: Applied Physics Letters

Journal number: 111/6

Journal publisher: American Institute of Physics

Published year: 2017

Published pages: 063105

DOI identifier: 10.1063/1.4986991

ISSN: 0003-6951