Novel approach for nano-patterning magnetic tunnel junctions stacks at narrow pitch: A route towards high density STT-MRAM applications

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Authors: V. D. Nguyen, P. Sabon, J. Chatterjee, L. Tille, P. Veloso Coelho, S. Auffret, R. Sousa, L. Prejbeanu, E. Gautier, L. Vila, B. Dieny

Journal title: 2017 IEEE International Electron Devices Meeting (IEDM)

Journal publisher: IEEE

Published year: 2017

Published pages: 38.5.1-38.5.4

DOI identifier: 10.1109/IEDM.2017.8268517

ISBN: 978-1-5386-3559-9