Performance and Low-Frequency Noise of 22-nm FDSOI Down to 4.2 K for Cryogenic Applications

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Authors: Bruna Cardoso Paz, Mikael Casse, Christoforos Theodorou, Gerard Ghibaudo, Thorsten Kammler, Luca Pirro, Maud Vinet, Silvano de Franceschi, Tristan Meunier, Fred Gaillard

Journal title: IEEE Transactions on Electron Devices

Journal publisher: Institute of Electrical and Electronics Engineers

Published year: 2020

Published pages: 1-5

DOI identifier: 10.1109/ted.2020.3021999

ISSN: 0018-9383