The Effect of Etching and Deposition Processes on the Width of Spacers Created during Self-Aligned Double Patterning

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Authors: Eberhard Baer, Juergen Lorenz

Journal title: 2018 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Journal publisher: IEEE

Published year: 2018

Published pages: 236-239

DOI identifier: 10.1109/sispad.2018.8551649

ISBN: 978-1-5386-6790-3