Modeling of block copolymer dry etching for directed self-assembly lithography

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Authors: Zelalem Tamrate Belete, Eberhard Baer, Andreas Erdmann

Journal title: Advanced Etch Technology for Nanopatterning VII

Journal publisher: SPIE

Published year: 2018

Published pages: 28

DOI identifier: 10.1117/12.2299977

ISBN: 9781-510616714