Unified feature scale model for etching in SF<inf>6</inf> and Cl plasma chemistries

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Authors: Xaver Klemenschits, Siegfried Selberherr, Lado Filipovic

Journal title: 2018 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon (EUROSOI-ULIS)

Journal publisher: IEEE

Published year: 2018

Published pages: 1-4

DOI identifier: 10.1109/ulis.2018.8354763

ISBN: 978-1-5386-4811-7