Carrier scattering by workfunction fluctuations and interface dipoles in high-K/metal gate stacks

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Authors: Zaiping Zeng, Francois Triozon, Yann-Michel Niquet

Journal title: 2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Journal publisher: IEEE

Published year: 2016

Published pages: 369-372

DOI identifier: 10.1109/SISPAD.2016.7605223

ISBN: 978-1-5090-0818-6