Integration of LaMnO 3+δ films on platinized silicon substrates for resistive switching applications by PI-MOCVD

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Authors: Raquel Rodriguez-Lamas, Dolors Pla, Odette Chaix-Pluchery, Benjamin Meunier, Fabrice Wilhelm, Andrei Rogalev, Laetitia Rapenne, Xavier Mescot, Quentin Rafhay, Hervé Roussel, Michel Boudard, Carmen Jiménez, Mónica Burriel

Journal title: Beilstein Journal of Nanotechnology

Journal number: 10

Journal publisher: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften

Published year: 2019

Published pages: 389-398

DOI identifier: 10.3762/bjnano.10.38

ISSN: 2190-4286