A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: Nils Boysen; Bujamin Misimi; Arbresha Muriqi; Jan-Lucas Wree; Tim Hasselmann; Detlef Rogalla; Tobias Haeger; Detlef Theirich; Michael Nolan; Michael Nolan; Thomas Riedl; Anjana Devi

Journal title: Chemical Communications

Journal number: 3

Journal publisher: Royal Society of Chemistry

Published year: 2020

DOI identifier: 10.1039/d0cc05781a

ISSN: 1359-7345